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Incorporating CFI60 optics for flawless inspection of 200mm wafers and masks. Combined with Nikon’s superior CFI60 LU/L optical system and an extraordinary new illumination system, this microscope provides images with greater contrast, high resolving power and darkfield images three times brighter than before. Used independently, or in combination with wafer loaders, the L200 series performs […]
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Combined with Nikon's superior CFI60 LU/L optical system and an extraordinary new illumination system, this microscope provides images with greater contrast, high resolving power and darkfield images three times brighter than before. Used independently, or in combination with wafer
loaders, the L200 series performs exceptionally precise optical
inspection of wafers, photo masks, reticles and other substrates.
L200: Offers 200mm wafer and mask inspection capabilities for reflected light illumination defect identification with various observation methods such as brightfield, darkfield, simple polarizing and DIC.
L200ND: Offers 200mm wafer and mask inspection capabilities for both transmitted and relfected light illumination. In addition to the observation methods of the L200N, epi-fluorescence observations including 365nm UV exicitation is possible.
L200A: Automated version of the L200N. Frequently used operations such as aperture control, focusing, brightfield/darkfield changeover, nosepiece rotation, lamp intensity control, and DIC settings are all motorized and can be controlled by the remote controller or a PC.
The bodies of these microscopes are finished with electrostatic discharge coatings to prevent foreign particles from adhering to the microscope. Furthermore, the motorized nosepiece uses a shielded center motor that traps foreign particles inside, preventing them from falling onto the sample.
The high intensity 12V-50W halogen illuminator, (LV-LH50PC) provides greater brightnessthat than of a 12V-100W halogen illuminator with half the power consumption. This new lamphouse incorporates a rear mirror and optimized lamp filament size to allow effective and uniform illumination on the pupil plane which is critical in an optical plane.
Nikon's CFI LU Plan objectives allow the use of multiple observation techniques, including brightfield, darkfield, and Nomarski DIC using a single objective. For DIC, simply insert a single Nomarski prism into the nosepiece that works for all magnification ranges.
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