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Optistation-3200

Redefining 300mm wafer inspection with Nikon’s CFI60 optical design. One of Nikon’s most advanced and versatile semiconductor inspection systems, the Optistation 3200 provides three-mode macro inspection capability – front, backside center, and backside perimeter – as well as high performance lighting techniques that allow for detection of a wide variety of process defects and particle/scratch […]

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Redefining 300mm wafer inspection with Nikon's CFI60 optical design.

One of Nikon's most advanced and versatile semiconductor inspection systems, the Optistation 3200 provides three-mode macro inspection capability – front, backside center, and backside perimeter – as well as high performance lighting techniques that allow for detection of a wide variety of process defects and particle/scratch detection.
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